Applied Materials introduces Centura Sculpta Patterning System

To help chipmakers continue shrinking designs without the added cost, complexity, and energy and materials consumption of EUV double patterning, Applied Materials worked closely with leading customers to develop the Centura Sculpta patterning system. Chipmakers can now print a single EUV pattern and then use the Sculpta system to elongate the shapes in any chosen direction to reduce the space between features and increase pattern density. Because the final pattern is created from a single mask, design cost and complexity are reduced, and the yield risk from double-patterning alignment errors is eliminated.